RETRACTED: Effect of different etching times on the structural, morphological, electrical, and antimicrobial properties of mesoporous silicon

P. Sivaprakash, Raja Venkatesan, S. Esakki Muthu, Mohammad Rafe Hatshan, Alexandre A. Vetcher, Seong-Cheol Kim, Ikhyun Kim

Open source

DOI
10.1016/j.heliyon.2023.e23105
Published
2023-12
Container
Heliyon
Publisher
Elsevier BV
Open access
unknown

Credibility signals

serious concern Score 29/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

Cite this work

BibTeX

@article{allodium:10.1016/j.heliyon.2023.e23105,
  title = {RETRACTED: Effect of different etching times on the structural, morphological, electrical, and antimicrobial properties of mesoporous silicon},
  author = {P. Sivaprakash and Raja Venkatesan and S. Esakki Muthu and Mohammad Rafe Hatshan and Alexandre A. Vetcher and Seong-Cheol Kim and Ikhyun Kim},
  year = {2023},
  journal = {Heliyon},
  doi = {10.1016/j.heliyon.2023.e23105},
  url = {https://doi.org/10.1016/j.heliyon.2023.e23105}
}

RIS

TY  - JOUR
TI  - RETRACTED: Effect of different etching times on the structural, morphological, electrical, and antimicrobial properties of mesoporous silicon
AU  - P. Sivaprakash
AU  - Raja Venkatesan
AU  - S. Esakki Muthu
AU  - Mohammad Rafe Hatshan
AU  - Alexandre A. Vetcher
AU  - Seong-Cheol Kim
AU  - Ikhyun Kim
PY  - 2023
JO  - Heliyon
DO  - 10.1016/j.heliyon.2023.e23105
UR  - https://doi.org/10.1016/j.heliyon.2023.e23105
ER  - 

APA

Sivaprakash, P., Venkatesan, R., Muthu, S. E., Hatshan, M. R., Vetcher, A. A., Kim, S., & Kim, I. (2023). RETRACTED: Effect of different etching times on the structural, morphological, electrical, and antimicrobial properties of mesoporous silicon. Heliyon. https://doi.org/10.1016/j.heliyon.2023.e23105

Source records