Co contamination of Si: Plating & aging.

Wang J, Ke D, Tian F, Xiong L, Chen H, Li M

DOI: 10.1016/j.heliyon.2024.e32530
Published: 2024 Jun 30
Container: Heliyon
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1016/j.heliyon.2024.e32530,
  title = {Co contamination of Si: Plating \& aging.},
  author = {Wang J and Ke D and Tian F and Xiong L and Chen H and Li M},
  year = {2024},
  journal = {Heliyon},
  doi = {10.1016/j.heliyon.2024.e32530},
  url = {https://doi.org/10.1016/j.heliyon.2024.e32530}
}

RIS

TY  - JOUR
TI  - Co contamination of Si: Plating & aging.
AU  - Wang J
AU  - Ke D
AU  - Tian F
AU  - Xiong L
AU  - Chen H
AU  - Li M
PY  - 2024
JO  - Heliyon
DO  - 10.1016/j.heliyon.2024.e32530
UR  - https://doi.org/10.1016/j.heliyon.2024.e32530
ER  -

APA

J, W., D, K., F, T., L, X., H, C., & M, L. (2024). Co contamination of Si: Plating & aging.. Heliyon. https://doi.org/10.1016/j.heliyon.2024.e32530

Source records

pubmed · retrieved 2026-09-25T21:30:01.043Z