Impact of Mo(+2) addition and thermal annealing on the surface morphology, electrical transport properties and Mott's parameters of WO(3) films for potential photonic devices.

Alshomar SM, Attia MS, Akl AA, Fathy N, Albaqawi HS, Affan H, Mohamed ES, Amin LG, Mahmoud SA

DOI: 10.1016/j.heliyon.2024.e36783
Published: 2024 Sep 15
Container: Heliyon
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1016/j.heliyon.2024.e36783,
  title = {Impact of Mo(+2) addition and thermal annealing on the surface morphology, electrical transport properties and Mott's parameters of WO(3) films for potential photonic devices.},
  author = {Alshomar SM and Attia MS and Akl AA and Fathy N and Albaqawi HS and Affan H and Mohamed ES and Amin LG and Mahmoud SA},
  year = {2024},
  journal = {Heliyon},
  doi = {10.1016/j.heliyon.2024.e36783},
  url = {https://doi.org/10.1016/j.heliyon.2024.e36783}
}

RIS

TY  - JOUR
TI  - Impact of Mo(+2) addition and thermal annealing on the surface morphology, electrical transport properties and Mott's parameters of WO(3) films for potential photonic devices.
AU  - Alshomar SM
AU  - Attia MS
AU  - Akl AA
AU  - Fathy N
AU  - Albaqawi HS
AU  - Affan H
AU  - Mohamed ES
AU  - Amin LG
AU  - Mahmoud SA
PY  - 2024
JO  - Heliyon
DO  - 10.1016/j.heliyon.2024.e36783
UR  - https://doi.org/10.1016/j.heliyon.2024.e36783
ER  -

APA

SM, A., MS, A., AA, A., N, F., HS, A., H, A., ES, M., LG, A., & SA, M. (2024). Impact of Mo(+2) addition and thermal annealing on the surface morphology, electrical transport properties and Mott's parameters of WO(3) films for potential photonic devices.. Heliyon. https://doi.org/10.1016/j.heliyon.2024.e36783

Source records

pubmed · retrieved 2026-09-26T07:00:46.712Z