Investigation on low thermal emittance of Al films deposited by magnetron sputtering.
- DOI
- 10.1016/j.infrared.2016.01.007
- Published
- 2016
- Container
- Infrared Physics and Technology
- Publisher
- Not recorded
- Open access
- no
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Cite this work
BibTeX
@article{allodium:10.1016/j.infrared.2016.01.007,
title = {Investigation on low thermal emittance of Al films deposited by magnetron sputtering.},
author = {Yuping Ning and Wenwen Wang and Ying Sun and Yongxin Wu and Yingfang Liu and Hongliang Man and Cong Wang and Yong Zhang and Shuxi Zhao and Eric Tomasella and Angélique Bousquet},
year = {2016},
journal = {Infrared Physics and Technology},
doi = {10.1016/j.infrared.2016.01.007},
url = {https://doi.org/10.1016/j.infrared.2016.01.007}
}RIS
TY - JOUR TI - Investigation on low thermal emittance of Al films deposited by magnetron sputtering. AU - Yuping Ning AU - Wenwen Wang AU - Ying Sun AU - Yongxin Wu AU - Yingfang Liu AU - Hongliang Man AU - Cong Wang AU - Yong Zhang AU - Shuxi Zhao AU - Eric Tomasella AU - Angélique Bousquet PY - 2016 JO - Infrared Physics and Technology DO - 10.1016/j.infrared.2016.01.007 UR - https://doi.org/10.1016/j.infrared.2016.01.007 ER -
APA
Ning, Y., Wang, W., Sun, Y., Wu, Y., Liu, Y., Man, H., Wang, C., Zhang, Y., Zhao, S., Tomasella, E., & Bousquet, A. (2016). Investigation on low thermal emittance of Al films deposited by magnetron sputtering.. Infrared Physics and Technology. https://doi.org/10.1016/j.infrared.2016.01.007
Source records
- hal · retrieved 2026-11-10T08:50:06.100Z