Integrative defect engineering and NiCo-layered double hydroxide decoration of W-doped BiVO4: a high-performance photoanode for efficient photoelectrochemical water splitting
- DOI
- 10.1016/j.jcis.2026.140998
- Published
- 2026-12
- Container
- Journal of Colloid and Interface Science
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/j.jcis.2026.140998,
title = {Integrative defect engineering and NiCo-layered double hydroxide decoration of W-doped BiVO4: a high-performance photoanode for efficient photoelectrochemical water splitting},
author = {Md. Masum Billah and Md. Ariful Islam and Hanzo Tsubota and Wai Kian Tan and Rajesh Kumar and Hiroyuki Muto and Atsunori Matsuda and Go Kawamura},
year = {2026},
journal = {Journal of Colloid and Interface Science},
doi = {10.1016/j.jcis.2026.140998},
url = {https://doi.org/10.1016/j.jcis.2026.140998}
}RIS
TY - JOUR TI - Integrative defect engineering and NiCo-layered double hydroxide decoration of W-doped BiVO4: a high-performance photoanode for efficient photoelectrochemical water splitting AU - Md. Masum Billah AU - Md. Ariful Islam AU - Hanzo Tsubota AU - Wai Kian Tan AU - Rajesh Kumar AU - Hiroyuki Muto AU - Atsunori Matsuda AU - Go Kawamura PY - 2026 JO - Journal of Colloid and Interface Science DO - 10.1016/j.jcis.2026.140998 UR - https://doi.org/10.1016/j.jcis.2026.140998 ER -
APA
Billah, M. M., Islam, M. A., Tsubota, H., Tan, W. K., Kumar, R., Muto, H., Matsuda, A., & Kawamura, G. (2026). Integrative defect engineering and NiCo-layered double hydroxide decoration of W-doped BiVO4: a high-performance photoanode for efficient photoelectrochemical water splitting. Journal of Colloid and Interface Science. https://doi.org/10.1016/j.jcis.2026.140998
Source records
- crossref · retrieved 2026-09-26T20:50:42.649Z