Integrative defect engineering and NiCo-layered double hydroxide decoration of W-doped BiVO4: a high-performance photoanode for efficient photoelectrochemical water splitting

Md. Masum Billah, Md. Ariful Islam, Hanzo Tsubota, Wai Kian Tan, Rajesh Kumar, Hiroyuki Muto, Atsunori Matsuda, Go Kawamura

Open source

DOI
10.1016/j.jcis.2026.140998
Published
2026-12
Container
Journal of Colloid and Interface Science
Publisher
Elsevier BV
Open access
unknown

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BibTeX

@article{allodium:10.1016/j.jcis.2026.140998,
  title = {Integrative defect engineering and NiCo-layered double hydroxide decoration of W-doped BiVO4: a high-performance photoanode for efficient photoelectrochemical water splitting},
  author = {Md. Masum Billah and Md. Ariful Islam and Hanzo Tsubota and Wai Kian Tan and Rajesh Kumar and Hiroyuki Muto and Atsunori Matsuda and Go Kawamura},
  year = {2026},
  journal = {Journal of Colloid and Interface Science},
  doi = {10.1016/j.jcis.2026.140998},
  url = {https://doi.org/10.1016/j.jcis.2026.140998}
}

RIS

TY  - JOUR
TI  - Integrative defect engineering and NiCo-layered double hydroxide decoration of W-doped BiVO4: a high-performance photoanode for efficient photoelectrochemical water splitting
AU  - Md. Masum Billah
AU  - Md. Ariful Islam
AU  - Hanzo Tsubota
AU  - Wai Kian Tan
AU  - Rajesh Kumar
AU  - Hiroyuki Muto
AU  - Atsunori Matsuda
AU  - Go Kawamura
PY  - 2026
JO  - Journal of Colloid and Interface Science
DO  - 10.1016/j.jcis.2026.140998
UR  - https://doi.org/10.1016/j.jcis.2026.140998
ER  - 

APA

Billah, M. M., Islam, M. A., Tsubota, H., Tan, W. K., Kumar, R., Muto, H., Matsuda, A., & Kawamura, G. (2026). Integrative defect engineering and NiCo-layered double hydroxide decoration of W-doped BiVO4: a high-performance photoanode for efficient photoelectrochemical water splitting. Journal of Colloid and Interface Science. https://doi.org/10.1016/j.jcis.2026.140998

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