Pattern distortion in nanoimprint lithography using UV-curable polymer stamps
- DOI
- 10.1016/j.mne.2024.100293
- Published
- 2024-12
- Container
- Micro and Nano Engineering
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/j.mne.2024.100293,
title = {Pattern distortion in nanoimprint lithography using UV-curable polymer stamps},
author = {Fangfang Li and Marina Fetisova and Mervi Koskinen and Jukka Viheriälä and Tapio Niemi and Petri Karvinen and Markku Kuittinen},
year = {2024},
journal = {Micro and Nano Engineering},
doi = {10.1016/j.mne.2024.100293},
url = {https://doi.org/10.1016/j.mne.2024.100293}
}RIS
TY - JOUR TI - Pattern distortion in nanoimprint lithography using UV-curable polymer stamps AU - Fangfang Li AU - Marina Fetisova AU - Mervi Koskinen AU - Jukka Viheriälä AU - Tapio Niemi AU - Petri Karvinen AU - Markku Kuittinen PY - 2024 JO - Micro and Nano Engineering DO - 10.1016/j.mne.2024.100293 UR - https://doi.org/10.1016/j.mne.2024.100293 ER -
APA
Li, F., Fetisova, M., Koskinen, M., Viheriälä, J., Niemi, T., Karvinen, P., & Kuittinen, M. (2024). Pattern distortion in nanoimprint lithography using UV-curable polymer stamps. Micro and Nano Engineering. https://doi.org/10.1016/j.mne.2024.100293
Source records
- crossref · retrieved 2026-09-25T15:14:26.026Z