AI-initialized level-set inversion for lithographic mask reconstruction

Feng-Lin Tsao, Tzu-Yu Lin, Chen Shuai, Tzu-Chun Lo, Yu-Heng Hung, Chun-Hung Lin

Open source

DOI: 10.1016/j.mne.2025.100312
Published: 2025-09
Container: Micro and Nano Engineering
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/j.mne.2025.100312,
  title = {AI-initialized level-set inversion for lithographic mask reconstruction},
  author = {Feng-Lin Tsao and Tzu-Yu Lin and Chen Shuai and Tzu-Chun Lo and Yu-Heng Hung and Chun-Hung Lin},
  year = {2025},
  journal = {Micro and Nano Engineering},
  doi = {10.1016/j.mne.2025.100312},
  url = {https://doi.org/10.1016/j.mne.2025.100312}
}

RIS

TY  - JOUR
TI  - AI-initialized level-set inversion for lithographic mask reconstruction
AU  - Feng-Lin Tsao
AU  - Tzu-Yu Lin
AU  - Chen Shuai
AU  - Tzu-Chun Lo
AU  - Yu-Heng Hung
AU  - Chun-Hung Lin
PY  - 2025
JO  - Micro and Nano Engineering
DO  - 10.1016/j.mne.2025.100312
UR  - https://doi.org/10.1016/j.mne.2025.100312
ER  -

APA

Tsao, F., Lin, T., Shuai, C., Lo, T., Hung, Y., & Lin, C. (2025). AI-initialized level-set inversion for lithographic mask reconstruction. Micro and Nano Engineering. https://doi.org/10.1016/j.mne.2025.100312

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crossref · retrieved 2026-09-25T13:27:34.689Z