Controlled growth of atomically thin transition metal dichalcogenides via chemical vapor deposition method
- DOI
- 10.1016/j.mtadv.2020.100098
- Published
- 2020-12
- Container
- Materials Today Advances
- Publisher
- Elsevier BV
- Open access
- unknown
Credibility signals
uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.
Show all credibility signals
- supportingDOI registered: A matching record was returned by Crossref.
- supportingDOI resolves: A matching record was returned by Crossref.
- not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility.
- not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made.
- not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made.
- not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made.
- not scoredROR affiliation: Not checked or no result supplied; no credibility inference made.
- not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete.
- not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete.
- not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete.
- not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete.
- not scoredOpen access status: Not checked or no result supplied; no credibility inference made.
- not scoredPublication license: Not checked or no result supplied; no credibility inference made.
- not scoredPublication version: A publication version was supplied but is not scored.
- supportingMetadata completeness: All 6 scored descriptive metadata groups are present.
Cite this work
BibTeX
@article{allodium:10.1016/j.mtadv.2020.100098,
title = {Controlled growth of atomically thin transition metal dichalcogenides via chemical vapor deposition method},
author = {J. Wang and T. Li and Q. Wang and W. Wang and R. Shi and N. Wang and A. Amini and C. Cheng},
year = {2020},
journal = {Materials Today Advances},
doi = {10.1016/j.mtadv.2020.100098},
url = {https://doi.org/10.1016/j.mtadv.2020.100098}
}RIS
TY - JOUR TI - Controlled growth of atomically thin transition metal dichalcogenides via chemical vapor deposition method AU - J. Wang AU - T. Li AU - Q. Wang AU - W. Wang AU - R. Shi AU - N. Wang AU - A. Amini AU - C. Cheng PY - 2020 JO - Materials Today Advances DO - 10.1016/j.mtadv.2020.100098 UR - https://doi.org/10.1016/j.mtadv.2020.100098 ER -
APA
Wang, J., Li, T., Wang, Q., Wang, W., Shi, R., Wang, N., Amini, A., & Cheng, C. (2020). Controlled growth of atomically thin transition metal dichalcogenides via chemical vapor deposition method. Materials Today Advances. https://doi.org/10.1016/j.mtadv.2020.100098
Source records
- crossref · retrieved 2026-09-25T18:05:10.193Z