eIF4E Resistance: Natural Variation Should Guide Gene Editing

Anna Bastet, Christophe Robaglia, Jean-Luc Gallois

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DOI: 10.1016/j.tplants.2017.01.008
Published: 2017-05
Container: Trends in Plant Science
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/j.tplants.2017.01.008,
  title = {eIF4E Resistance: Natural Variation Should Guide Gene Editing},
  author = {Anna Bastet and Christophe Robaglia and Jean-Luc Gallois},
  year = {2017},
  journal = {Trends in Plant Science},
  doi = {10.1016/j.tplants.2017.01.008},
  url = {https://doi.org/10.1016/j.tplants.2017.01.008}
}

RIS

TY  - JOUR
TI  - eIF4E Resistance: Natural Variation Should Guide Gene Editing
AU  - Anna Bastet
AU  - Christophe Robaglia
AU  - Jean-Luc Gallois
PY  - 2017
JO  - Trends in Plant Science
DO  - 10.1016/j.tplants.2017.01.008
UR  - https://doi.org/10.1016/j.tplants.2017.01.008
ER  -

APA

Bastet, A., Robaglia, C., & Gallois, J. (2017). eIF4E Resistance: Natural Variation Should Guide Gene Editing. Trends in Plant Science. https://doi.org/10.1016/j.tplants.2017.01.008

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crossref · retrieved 2026-09-27T16:37:36.784Z