Dielectric oxynitride LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive radio-frequency sputtering
- DOI
- 10.1016/j.tsf.2011.10.192
- Published
- 2012-05-01
- Container
- Thin Solid Films
- Publisher
- Not recorded
- Open access
- no
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Cite this work
BibTeX
@article{allodium:10.1016/j.tsf.2011.10.192,
title = {Dielectric oxynitride LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive radio-frequency sputtering},
author = {Ahmed Ziani and Claire Le Paven-Thivet and Didier Fasquelle and Laurent Le Gendre and Ratiba Benzerga and Franck Tessier and François Cheviré and Jean-Claude Carru and Ala Sharaiha},
year = {2012},
journal = {Thin Solid Films},
doi = {10.1016/j.tsf.2011.10.192},
url = {https://doi.org/10.1016/j.tsf.2011.10.192}
}RIS
TY - JOUR TI - Dielectric oxynitride LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive radio-frequency sputtering AU - Ahmed Ziani AU - Claire Le Paven-Thivet AU - Didier Fasquelle AU - Laurent Le Gendre AU - Ratiba Benzerga AU - Franck Tessier AU - François Cheviré AU - Jean-Claude Carru AU - Ala Sharaiha PY - 2012 JO - Thin Solid Films DO - 10.1016/j.tsf.2011.10.192 UR - https://doi.org/10.1016/j.tsf.2011.10.192 ER -
APA
Ziani, A., Paven-Thivet, C. L., Fasquelle, D., Gendre, L. L., Benzerga, R., Tessier, F., Cheviré, F., Carru, J., & Sharaiha, A. (2012). Dielectric oxynitride LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive radio-frequency sputtering. Thin Solid Films. https://doi.org/10.1016/j.tsf.2011.10.192
Source records
- hal · retrieved 2026-09-26T07:16:48.431Z