Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures
- DOI
- 10.1016/j.tsf.2013.11.073
- Published
- 2014-01
- Container
- Thin Solid Films
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/j.tsf.2013.11.073,
title = {Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures},
author = {K. Ait Aissa and A. Achour and J. Camus and L. Le Brizoual and P.-Y. Jouan and M.-A. Djouadi},
year = {2014},
journal = {Thin Solid Films},
doi = {10.1016/j.tsf.2013.11.073},
url = {https://doi.org/10.1016/j.tsf.2013.11.073}
}RIS
TY - JOUR TI - Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures AU - K. Ait Aissa AU - A. Achour AU - J. Camus AU - L. Le Brizoual AU - P.-Y. Jouan AU - M.-A. Djouadi PY - 2014 JO - Thin Solid Films DO - 10.1016/j.tsf.2013.11.073 UR - https://doi.org/10.1016/j.tsf.2013.11.073 ER -
APA
Aissa, K. A., Achour, A., Camus, J., Brizoual, L. L., Jouan, P., & Djouadi, M. (2014). Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures. Thin Solid Films. https://doi.org/10.1016/j.tsf.2013.11.073
Source records
- crossref · retrieved 2026-11-09T14:55:27.217Z