Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions
- DOI
- 10.1016/j.tsf.2020.137874
- Published
- 2020-03
- Container
- Thin Solid Films
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/j.tsf.2020.137874,
title = {Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions},
author = {Vivien Cartailler and Grégory Imbert and Névine Rochat and Catherine Chaton and Du Vo-Thanh and Daniel Benoit and Geneviève Duchamp and Hélène Frémont},
year = {2020},
journal = {Thin Solid Films},
doi = {10.1016/j.tsf.2020.137874},
url = {https://doi.org/10.1016/j.tsf.2020.137874}
}RIS
TY - JOUR TI - Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions AU - Vivien Cartailler AU - Grégory Imbert AU - Névine Rochat AU - Catherine Chaton AU - Du Vo-Thanh AU - Daniel Benoit AU - Geneviève Duchamp AU - Hélène Frémont PY - 2020 JO - Thin Solid Films DO - 10.1016/j.tsf.2020.137874 UR - https://doi.org/10.1016/j.tsf.2020.137874 ER -
APA
Cartailler, V., Imbert, G., Rochat, N., Chaton, C., Vo-Thanh, D., Benoit, D., Duchamp, G., & Frémont, H. (2020). Moisture diffusion in plasma-enhanced chemical vapor deposition dielectrics characterized with three techniques under clean room conditions. Thin Solid Films. https://doi.org/10.1016/j.tsf.2020.137874
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- crossref · retrieved 2026-09-25T14:01:06.962Z