Ultra-thin inorganic oxide and nitride films as an alternative blocking layer for electrochemical sensors.

McHenry A, Jolly G, Young T, Brothers M, Coyle V, Kim S, Heikenfeld J

Open source

DOI
10.1016/j.tsf.2025.140712
Published
2025 Aug 15
Container
Thin solid films
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1016/j.tsf.2025.140712,
  title = {Ultra-thin inorganic oxide and nitride films as an alternative blocking layer for electrochemical sensors.},
  author = {McHenry A and Jolly G and Young T and Brothers M and Coyle V and Kim S and Heikenfeld J},
  year = {2025},
  journal = {Thin solid films},
  doi = {10.1016/j.tsf.2025.140712},
  url = {https://doi.org/10.1016/j.tsf.2025.140712}
}

RIS

TY  - JOUR
TI  - Ultra-thin inorganic oxide and nitride films as an alternative blocking layer for electrochemical sensors.
AU  - McHenry A
AU  - Jolly G
AU  - Young T
AU  - Brothers M
AU  - Coyle V
AU  - Kim S
AU  - Heikenfeld J
PY  - 2025
JO  - Thin solid films
DO  - 10.1016/j.tsf.2025.140712
UR  - https://doi.org/10.1016/j.tsf.2025.140712
ER  - 

APA

A, M., G, J., T, Y., M, B., V, C., S, K., & J, H. (2025). Ultra-thin inorganic oxide and nitride films as an alternative blocking layer for electrochemical sensors.. Thin solid films. https://doi.org/10.1016/j.tsf.2025.140712

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