Validating electron pair distribution function analysis: The role of multiple scattering, beam, measurement, and processing parameters.

Kang S, Cho H, Töllner M, Wollersen V, Wang D, Baik H, Perera MJ, Adjaoud O, Albe K, Kübel C, Mu X

Open source

DOI
10.1016/j.ultramic.2025.114295
Published
2026 Mar
Container
Ultramicroscopy
Publisher
Not recorded
Open access
unknown

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BibTeX

@article{allodium:10.1016/j.ultramic.2025.114295,
  title = {Validating electron pair distribution function analysis: The role of multiple scattering, beam, measurement, and processing parameters.},
  author = {Kang S and Cho H and Töllner M and Wollersen V and Wang D and Baik H and Perera MJ and Adjaoud O and Albe K and Kübel C and Mu X},
  year = {2026},
  journal = {Ultramicroscopy},
  doi = {10.1016/j.ultramic.2025.114295},
  url = {https://doi.org/10.1016/j.ultramic.2025.114295}
}

RIS

TY  - JOUR
TI  - Validating electron pair distribution function analysis: The role of multiple scattering, beam, measurement, and processing parameters.
AU  - Kang S
AU  - Cho H
AU  - Töllner M
AU  - Wollersen V
AU  - Wang D
AU  - Baik H
AU  - Perera MJ
AU  - Adjaoud O
AU  - Albe K
AU  - Kübel C
AU  - Mu X
PY  - 2026
JO  - Ultramicroscopy
DO  - 10.1016/j.ultramic.2025.114295
UR  - https://doi.org/10.1016/j.ultramic.2025.114295
ER  - 

APA

S, K., H, C., M, T., V, W., D, W., H, B., MJ, P., O, A., K, A., C, K., & X, M. (2026). Validating electron pair distribution function analysis: The role of multiple scattering, beam, measurement, and processing parameters.. Ultramicroscopy. https://doi.org/10.1016/j.ultramic.2025.114295

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