The effect of pattern quality on measurements of stress heterogeneity and geometrically necessary dislocation density by high-angular resolution electron backscatter diffraction

Harison S. Wiesman, David Wallis

Open source

DOI
10.1016/j.ultramic.2026.114330
Published
2026-04
Container
Ultramicroscopy
Publisher
Elsevier BV
Open access
unknown

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BibTeX

@article{allodium:10.1016/j.ultramic.2026.114330,
  title = {The effect of pattern quality on measurements of stress heterogeneity and geometrically necessary dislocation density by high-angular resolution electron backscatter diffraction},
  author = {Harison S. Wiesman and David Wallis},
  year = {2026},
  journal = {Ultramicroscopy},
  doi = {10.1016/j.ultramic.2026.114330},
  url = {https://doi.org/10.1016/j.ultramic.2026.114330}
}

RIS

TY  - JOUR
TI  - The effect of pattern quality on measurements of stress heterogeneity and geometrically necessary dislocation density by high-angular resolution electron backscatter diffraction
AU  - Harison S. Wiesman
AU  - David Wallis
PY  - 2026
JO  - Ultramicroscopy
DO  - 10.1016/j.ultramic.2026.114330
UR  - https://doi.org/10.1016/j.ultramic.2026.114330
ER  - 

APA

Wiesman, H. S., & Wallis, D. (2026). The effect of pattern quality on measurements of stress heterogeneity and geometrically necessary dislocation density by high-angular resolution electron backscatter diffraction. Ultramicroscopy. https://doi.org/10.1016/j.ultramic.2026.114330

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