The simultaneous determination of carbon and oxygen in semiconductor silicon by helium-3 activation analysis

C. Vandecasteele, F. Adams, J. Hoste

Open source

DOI: 10.1016/s0003-2670(01)95856-8
Published: 1974-10
Container: Analytica Chimica Acta
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/s0003-2670-01-95856-8,
  title = {The simultaneous determination of carbon and oxygen in semiconductor silicon by helium-3 activation analysis},
  author = {C. Vandecasteele and F. Adams and J. Hoste},
  year = {1974},
  journal = {Analytica Chimica Acta},
  doi = {10.1016/s0003-2670(01)95856-8},
  url = {https://doi.org/10.1016/s0003-2670(01)95856-8}
}

RIS

TY  - JOUR
TI  - The simultaneous determination of carbon and oxygen in semiconductor silicon by helium-3 activation analysis
AU  - C. Vandecasteele
AU  - F. Adams
AU  - J. Hoste
PY  - 1974
JO  - Analytica Chimica Acta
DO  - 10.1016/s0003-2670(01)95856-8
UR  - https://doi.org/10.1016/s0003-2670(01)95856-8
ER  -

APA

Vandecasteele, C., Adams, F., & Hoste, J. (1974). The simultaneous determination of carbon and oxygen in semiconductor silicon by helium-3 activation analysis. Analytica Chimica Acta. https://doi.org/10.1016/s0003-2670(01)95856-8

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crossref · retrieved 2026-11-05T13:58:09.030Z