Chemistry and kinetics of chemical vapour deposition of pyrocarbon

J. Antes, Z. Hu, W. Zhang, K.J. Hüttinger

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DOI: 10.1016/s0008-6223(99)00070-6
Published: 1999
Container: Carbon
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/s0008-6223-99-00070-6,
  title = {Chemistry and kinetics of chemical vapour deposition of pyrocarbon},
  author = {J. Antes and Z. Hu and W. Zhang and K.J. Hüttinger},
  year = {1999},
  journal = {Carbon},
  doi = {10.1016/s0008-6223(99)00070-6},
  url = {https://doi.org/10.1016/s0008-6223(99)00070-6}
}

RIS

TY  - JOUR
TI  - Chemistry and kinetics of chemical vapour deposition of pyrocarbon
AU  - J. Antes
AU  - Z. Hu
AU  - W. Zhang
AU  - K.J. Hüttinger
PY  - 1999
JO  - Carbon
DO  - 10.1016/s0008-6223(99)00070-6
UR  - https://doi.org/10.1016/s0008-6223(99)00070-6
ER  -

APA

Antes, J., Hu, Z., Zhang, W., & Hüttinger, K. (1999). Chemistry and kinetics of chemical vapour deposition of pyrocarbon. Carbon. https://doi.org/10.1016/s0008-6223(99)00070-6

Source records

crossref · retrieved 2026-11-10T19:55:45.846Z