Step-flow mechanism versus pit corrosion: scanning-tunneling microscopy observations on wet etching of Si(111) by HF solutions
- DOI
- 10.1016/s0009-2614(91)85140-r
- Published
- 1991-11
- Container
- Chemical Physics Letters
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/s0009-2614-91-85140-r,
title = {Step-flow mechanism versus pit corrosion: scanning-tunneling microscopy observations on wet etching of Si(111) by HF solutions},
author = {H.E. Hessel and A. Feltz and M. Reiter and U. Memmert and R.J. Behm},
year = {1991},
journal = {Chemical Physics Letters},
doi = {10.1016/s0009-2614(91)85140-r},
url = {https://doi.org/10.1016/s0009-2614(91)85140-r}
}RIS
TY - JOUR TI - Step-flow mechanism versus pit corrosion: scanning-tunneling microscopy observations on wet etching of Si(111) by HF solutions AU - H.E. Hessel AU - A. Feltz AU - M. Reiter AU - U. Memmert AU - R.J. Behm PY - 1991 JO - Chemical Physics Letters DO - 10.1016/s0009-2614(91)85140-r UR - https://doi.org/10.1016/s0009-2614(91)85140-r ER -
APA
Hessel, H., Feltz, A., Reiter, M., Memmert, U., & Behm, R. (1991). Step-flow mechanism versus pit corrosion: scanning-tunneling microscopy observations on wet etching of Si(111) by HF solutions. Chemical Physics Letters. https://doi.org/10.1016/s0009-2614(91)85140-r
Source records
- crossref · retrieved 2026-09-26T09:31:49.241Z