Low pressure microwave plasma assisted chemical vapor deposition (MPCVD) of diamond coatings on silicon nitride cutting tools

K. Mallika, R. Komanduri

Open source

DOI: 10.1016/s0040-6090(01)01262-7
Published: 2001-09
Container: Thin Solid Films
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/s0040-6090-01-01262-7,
  title = {Low pressure microwave plasma assisted chemical vapor deposition (MPCVD) of diamond coatings on silicon nitride cutting tools},
  author = {K. Mallika and R. Komanduri},
  year = {2001},
  journal = {Thin Solid Films},
  doi = {10.1016/s0040-6090(01)01262-7},
  url = {https://doi.org/10.1016/s0040-6090(01)01262-7}
}

RIS

TY  - JOUR
TI  - Low pressure microwave plasma assisted chemical vapor deposition (MPCVD) of diamond coatings on silicon nitride cutting tools
AU  - K. Mallika
AU  - R. Komanduri
PY  - 2001
JO  - Thin Solid Films
DO  - 10.1016/s0040-6090(01)01262-7
UR  - https://doi.org/10.1016/s0040-6090(01)01262-7
ER  -

APA

Mallika, K., & Komanduri, R. (2001). Low pressure microwave plasma assisted chemical vapor deposition (MPCVD) of diamond coatings on silicon nitride cutting tools. Thin Solid Films. https://doi.org/10.1016/s0040-6090(01)01262-7

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crossref · retrieved 2026-09-25T21:00:28.607Z