Thin film atomic layer deposition equipment for semiconductor processing

Ofer Sneh, Robert B Clark-Phelps, Ana R Londergan, Jereld Winkler, Thomas E Seidel

Open source

DOI: 10.1016/s0040-6090(01)01678-9
Published: 2002-01
Container: Thin Solid Films
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/s0040-6090-01-01678-9,
  title = {Thin film atomic layer deposition equipment for semiconductor processing},
  author = {Ofer Sneh and Robert B Clark-Phelps and Ana R Londergan and Jereld Winkler and Thomas E Seidel},
  year = {2002},
  journal = {Thin Solid Films},
  doi = {10.1016/s0040-6090(01)01678-9},
  url = {https://doi.org/10.1016/s0040-6090(01)01678-9}
}

RIS

TY  - JOUR
TI  - Thin film atomic layer deposition equipment for semiconductor processing
AU  - Ofer Sneh
AU  - Robert B Clark-Phelps
AU  - Ana R Londergan
AU  - Jereld Winkler
AU  - Thomas E Seidel
PY  - 2002
JO  - Thin Solid Films
DO  - 10.1016/s0040-6090(01)01678-9
UR  - https://doi.org/10.1016/s0040-6090(01)01678-9
ER  -

APA

Sneh, O., Clark-Phelps, R. B., Londergan, A. R., Winkler, J., & Seidel, T. E. (2002). Thin film atomic layer deposition equipment for semiconductor processing. Thin Solid Films. https://doi.org/10.1016/s0040-6090(01)01678-9

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crossref · retrieved 2026-09-27T15:09:24.595Z