Micropatterning of SiO2 film using organosilicon nanocluster as a precursor

Akira Watanabe, Mamoru Fujitsuka, Osamu Ito

Open source

DOI: 10.1016/s0040-6090(99)00560-x
Published: 1999-10
Container: Thin Solid Films
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/s0040-6090-99-00560-x,
  title = {Micropatterning of SiO2 film using organosilicon nanocluster as a precursor},
  author = {Akira Watanabe and Mamoru Fujitsuka and Osamu Ito},
  year = {1999},
  journal = {Thin Solid Films},
  doi = {10.1016/s0040-6090(99)00560-x},
  url = {https://doi.org/10.1016/s0040-6090(99)00560-x}
}

RIS

TY  - JOUR
TI  - Micropatterning of SiO2 film using organosilicon nanocluster as a precursor
AU  - Akira Watanabe
AU  - Mamoru Fujitsuka
AU  - Osamu Ito
PY  - 1999
JO  - Thin Solid Films
DO  - 10.1016/s0040-6090(99)00560-x
UR  - https://doi.org/10.1016/s0040-6090(99)00560-x
ER  -

APA

Watanabe, A., Fujitsuka, M., & Ito, O. (1999). Micropatterning of SiO2 film using organosilicon nanocluster as a precursor. Thin Solid Films. https://doi.org/10.1016/s0040-6090(99)00560-x

Source records

crossref · retrieved 2026-09-26T00:13:35.836Z