Ion Projection Lithography: Progress of European MEDEA & International Program
- DOI
- 10.1016/s0167-9317(00)00263-x
- Published
- 2000-06
- Container
- Microelectronic Engineering
- Publisher
- Elsevier BV
- Open access
- unknown
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uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.
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Cite this work
BibTeX
@article{allodium:10.1016/s0167-9317-00-00263-x,
title = {Ion Projection Lithography: Progress of European MEDEA \& International Program},
author = {Rainer Kaesmaier and Hans Löschner},
year = {2000},
journal = {Microelectronic Engineering},
doi = {10.1016/s0167-9317(00)00263-x},
url = {https://doi.org/10.1016/s0167-9317(00)00263-x}
}RIS
TY - JOUR TI - Ion Projection Lithography: Progress of European MEDEA & International Program AU - Rainer Kaesmaier AU - Hans Löschner PY - 2000 JO - Microelectronic Engineering DO - 10.1016/s0167-9317(00)00263-x UR - https://doi.org/10.1016/s0167-9317(00)00263-x ER -
APA
Kaesmaier, R., & Löschner, H. (2000). Ion Projection Lithography: Progress of European MEDEA & International Program. Microelectronic Engineering. https://doi.org/10.1016/s0167-9317(00)00263-x
Source records
- crossref · retrieved 2026-09-25T21:29:01.172Z