High performance positive DUV photoresists AZ® DX 1100P, AZ® DX 1200P. AZ® DX 1300P, AZ® DX 2034P, AZ® DX 2058P for advanced lithographic applications

W. Spiess, S. Funato, Y. Kinoshita, Y. Nozaki, G. Pawlowski

Open source

DOI
10.1016/s0167-9317(98)00078-1
Published
1998-03
Container
Microelectronic Engineering
Publisher
Elsevier BV
Open access
unknown

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BibTeX

@article{allodium:10.1016/s0167-9317-98-00078-1,
  title = {High performance positive DUV photoresists AZ® DX 1100P, AZ® DX 1200P. AZ® DX 1300P, AZ® DX 2034P, AZ® DX 2058P for advanced lithographic applications},
  author = {W. Spiess and S. Funato and Y. Kinoshita and Y. Nozaki and G. Pawlowski},
  year = {1998},
  journal = {Microelectronic Engineering},
  doi = {10.1016/s0167-9317(98)00078-1},
  url = {https://doi.org/10.1016/s0167-9317(98)00078-1}
}

RIS

TY  - JOUR
TI  - High performance positive DUV photoresists AZ® DX 1100P, AZ® DX 1200P. AZ® DX 1300P, AZ® DX 2034P, AZ® DX 2058P for advanced lithographic applications
AU  - W. Spiess
AU  - S. Funato
AU  - Y. Kinoshita
AU  - Y. Nozaki
AU  - G. Pawlowski
PY  - 1998
JO  - Microelectronic Engineering
DO  - 10.1016/s0167-9317(98)00078-1
UR  - https://doi.org/10.1016/s0167-9317(98)00078-1
ER  - 

APA

Spiess, W., Funato, S., Kinoshita, Y., Nozaki, Y., & Pawlowski, G. (1998). High performance positive DUV photoresists AZ® DX 1100P, AZ® DX 1200P. AZ® DX 1300P, AZ® DX 2034P, AZ® DX 2058P for advanced lithographic applications. Microelectronic Engineering. https://doi.org/10.1016/s0167-9317(98)00078-1

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