Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization

M.H Hong, Y.F Lu, T.M Ho, L.W Lu, T.S Low

Open source

DOI: 10.1016/s0169-4332(98)00444-9
Published: 1999-01
Container: Applied Surface Science
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/s0169-4332-98-00444-9,
  title = {Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization},
  author = {M.H Hong and Y.F Lu and T.M Ho and L.W Lu and T.S Low},
  year = {1999},
  journal = {Applied Surface Science},
  doi = {10.1016/s0169-4332(98)00444-9},
  url = {https://doi.org/10.1016/s0169-4332(98)00444-9}
}

RIS

TY  - JOUR
TI  - Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization
AU  - M.H Hong
AU  - Y.F Lu
AU  - T.M Ho
AU  - L.W Lu
AU  - T.S Low
PY  - 1999
JO  - Applied Surface Science
DO  - 10.1016/s0169-4332(98)00444-9
UR  - https://doi.org/10.1016/s0169-4332(98)00444-9
ER  -

APA

Hong, M., Lu, Y., Ho, T., Lu, L., & Low, T. (1999). Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization. Applied Surface Science. https://doi.org/10.1016/s0169-4332(98)00444-9

Source records

crossref · retrieved 2026-09-25T21:26:42.909Z