Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films
- DOI
- 10.1016/s0257-8972(96)03111-8
- Published
- 1997-03
- Container
- Surface and Coatings Technology
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/s0257-8972-96-03111-8,
title = {Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films},
author = {R.A. Synowicki and Jeffrey S. Hale and R.D. Kubik and S. Nafis and John A. Woollam},
year = {1997},
journal = {Surface and Coatings Technology},
doi = {10.1016/s0257-8972(96)03111-8},
url = {https://doi.org/10.1016/s0257-8972(96)03111-8}
}RIS
TY - JOUR TI - Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films AU - R.A. Synowicki AU - Jeffrey S. Hale AU - R.D. Kubik AU - S. Nafis AU - John A. Woollam PY - 1997 JO - Surface and Coatings Technology DO - 10.1016/s0257-8972(96)03111-8 UR - https://doi.org/10.1016/s0257-8972(96)03111-8 ER -
APA
Synowicki, R., Hale, J. S., Kubik, R., Nafis, S., & Woollam, J. A. (1997). Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films. Surface and Coatings Technology. https://doi.org/10.1016/s0257-8972(96)03111-8
Source records
- crossref · retrieved 2026-09-27T01:34:59.879Z