Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films

R.A. Synowicki, Jeffrey S. Hale, R.D. Kubik, S. Nafis, John A. Woollam

Open source

DOI
10.1016/s0257-8972(96)03111-8
Published
1997-03
Container
Surface and Coatings Technology
Publisher
Elsevier BV
Open access
unknown

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BibTeX

@article{allodium:10.1016/s0257-8972-96-03111-8,
  title = {Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films},
  author = {R.A. Synowicki and Jeffrey S. Hale and R.D. Kubik and S. Nafis and John A. Woollam},
  year = {1997},
  journal = {Surface and Coatings Technology},
  doi = {10.1016/s0257-8972(96)03111-8},
  url = {https://doi.org/10.1016/s0257-8972(96)03111-8}
}

RIS

TY  - JOUR
TI  - Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films
AU  - R.A. Synowicki
AU  - Jeffrey S. Hale
AU  - R.D. Kubik
AU  - S. Nafis
AU  - John A. Woollam
PY  - 1997
JO  - Surface and Coatings Technology
DO  - 10.1016/s0257-8972(96)03111-8
UR  - https://doi.org/10.1016/s0257-8972(96)03111-8
ER  - 

APA

Synowicki, R., Hale, J. S., Kubik, R., Nafis, S., & Woollam, J. A. (1997). Microstructural characterization of SiOx surface contaminants on ashed aluminum thin films. Surface and Coatings Technology. https://doi.org/10.1016/s0257-8972(96)03111-8

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