Film thickness dependence of microwave surface resistance and microstructure in YBa2Cu3O7−δ thin films

S.J Wang, L.P You, C.K Ong, X Zhang

Open source

DOI: 10.1016/s0921-4534(00)01555-0
Published: 2001-01
Container: Physica C: Superconductivity
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/s0921-4534-00-01555-0,
  title = {Film thickness dependence of microwave surface resistance and microstructure in YBa2Cu3O7−δ thin films},
  author = {S.J Wang and L.P You and C.K Ong and X Zhang},
  year = {2001},
  journal = {Physica C: Superconductivity},
  doi = {10.1016/s0921-4534(00)01555-0},
  url = {https://doi.org/10.1016/s0921-4534(00)01555-0}
}

RIS

TY  - JOUR
TI  - Film thickness dependence of microwave surface resistance and microstructure in YBa2Cu3O7−δ thin films
AU  - S.J Wang
AU  - L.P You
AU  - C.K Ong
AU  - X Zhang
PY  - 2001
JO  - Physica C: Superconductivity
DO  - 10.1016/s0921-4534(00)01555-0
UR  - https://doi.org/10.1016/s0921-4534(00)01555-0
ER  -

APA

Wang, S., You, L., Ong, C., & Zhang, X. (2001). Film thickness dependence of microwave surface resistance and microstructure in YBa2Cu3O7−δ thin films. Physica C: Superconductivity. https://doi.org/10.1016/s0921-4534(00)01555-0

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crossref · retrieved 2026-09-25T21:29:17.525Z