Amorphous and microcrystalline silicon solar cells prepared at high deposition rates using RF (13.56MHz) plasma excitation frequencies
- DOI
- 10.1016/s0927-0248(00)00183-5
- Published
- 2001-02
- Container
- Solar Energy Materials and Solar Cells
- Publisher
- Elsevier BV
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1016/s0927-0248-00-00183-5,
title = {Amorphous and microcrystalline silicon solar cells prepared at high deposition rates using RF (13.56MHz) plasma excitation frequencies},
author = {B Rech and T Roschek and J Müller and S Wieder and H Wagner},
year = {2001},
journal = {Solar Energy Materials and Solar Cells},
doi = {10.1016/s0927-0248(00)00183-5},
url = {https://doi.org/10.1016/s0927-0248(00)00183-5}
}RIS
TY - JOUR TI - Amorphous and microcrystalline silicon solar cells prepared at high deposition rates using RF (13.56MHz) plasma excitation frequencies AU - B Rech AU - T Roschek AU - J Müller AU - S Wieder AU - H Wagner PY - 2001 JO - Solar Energy Materials and Solar Cells DO - 10.1016/s0927-0248(00)00183-5 UR - https://doi.org/10.1016/s0927-0248(00)00183-5 ER -
APA
Rech, B., Roschek, T., Müller, J., Wieder, S., & Wagner, H. (2001). Amorphous and microcrystalline silicon solar cells prepared at high deposition rates using RF (13.56MHz) plasma excitation frequencies. Solar Energy Materials and Solar Cells. https://doi.org/10.1016/s0927-0248(00)00183-5
Source records
- crossref · retrieved 2026-09-25T21:48:43.290Z