Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

C. Chaneliere, J.L. Autran, R.A.B. Devine, B. Balland

Open source

DOI: 10.1016/s0927-796x(97)00023-5
Published: 1998-05
Container: Materials Science and Engineering: R: Reports
Publisher: Elsevier BV
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1016/s0927-796x-97-00023-5,
  title = {Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications},
  author = {C. Chaneliere and J.L. Autran and R.A.B. Devine and B. Balland},
  year = {1998},
  journal = {Materials Science and Engineering: R: Reports},
  doi = {10.1016/s0927-796x(97)00023-5},
  url = {https://doi.org/10.1016/s0927-796x(97)00023-5}
}

RIS

TY  - JOUR
TI  - Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
AU  - C. Chaneliere
AU  - J.L. Autran
AU  - R.A.B. Devine
AU  - B. Balland
PY  - 1998
JO  - Materials Science and Engineering: R: Reports
DO  - 10.1016/s0927-796x(97)00023-5
UR  - https://doi.org/10.1016/s0927-796x(97)00023-5
ER  -

APA

Chaneliere, C., Autran, J., Devine, R., & Balland, B. (1998). Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications. Materials Science and Engineering: R: Reports. https://doi.org/10.1016/s0927-796x(97)00023-5

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crossref · retrieved 2026-09-26T00:01:02.665Z