Electrochemical Exploration of Layered Cu-Based Oxychalcogenides Obtained Topochemically via Anionic Redox and Displacement Reaction
- DOI
- 10.1021/acs.chemmater.3c00803
- Published
- 2023-06-20
- Container
- Chemistry of Materials
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acs.chemmater.3c00803,
title = {Electrochemical Exploration of Layered Cu-Based Oxychalcogenides Obtained Topochemically via Anionic Redox and Displacement Reaction},
author = {Anshuman Chaupatnaik and Artem M. Abakumov and Gwenaëlle Rousse and Dominique Foix and Jacques Louis and Bernhard T. Leube and Jean-Marie Tarascon},
year = {2023},
journal = {Chemistry of Materials},
doi = {10.1021/acs.chemmater.3c00803},
url = {https://doi.org/10.1021/acs.chemmater.3c00803}
}RIS
TY - JOUR TI - Electrochemical Exploration of Layered Cu-Based Oxychalcogenides Obtained Topochemically via Anionic Redox and Displacement Reaction AU - Anshuman Chaupatnaik AU - Artem M. Abakumov AU - Gwenaëlle Rousse AU - Dominique Foix AU - Jacques Louis AU - Bernhard T. Leube AU - Jean-Marie Tarascon PY - 2023 JO - Chemistry of Materials DO - 10.1021/acs.chemmater.3c00803 UR - https://doi.org/10.1021/acs.chemmater.3c00803 ER -
APA
Chaupatnaik, A., Abakumov, A. M., Rousse, G., Foix, D., Louis, J., Leube, B. T., & Tarascon, J. (2023). Electrochemical Exploration of Layered Cu-Based Oxychalcogenides Obtained Topochemically via Anionic Redox and Displacement Reaction. Chemistry of Materials. https://doi.org/10.1021/acs.chemmater.3c00803
Source records
- crossref · retrieved 2026-09-26T13:33:35.012Z