In Situ Process Control during Wet-Chemical Etching of Heteroepitaxial III-V Layers Using Reflection Anisotropy Spectroscopy.
- DOI
- 10.1021/acs.jpca.6c02573
- Published
- 2026 Aug 13
- Container
- The journal of physical chemistry. A
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.1021/acs.jpca.6c02573,
title = {In Situ Process Control during Wet-Chemical Etching of Heteroepitaxial III-V Layers Using Reflection Anisotropy Spectroscopy.},
author = {Schmitt EA and Guidat M and Flieg M and Grutke J and Diecke M and Möller K and Euchner H and May MM},
year = {2026},
journal = {The journal of physical chemistry. A},
doi = {10.1021/acs.jpca.6c02573},
url = {https://doi.org/10.1021/acs.jpca.6c02573}
}RIS
TY - JOUR TI - In Situ Process Control during Wet-Chemical Etching of Heteroepitaxial III-V Layers Using Reflection Anisotropy Spectroscopy. AU - Schmitt EA AU - Guidat M AU - Flieg M AU - Grutke J AU - Diecke M AU - Möller K AU - Euchner H AU - May MM PY - 2026 JO - The journal of physical chemistry. A DO - 10.1021/acs.jpca.6c02573 UR - https://doi.org/10.1021/acs.jpca.6c02573 ER -
APA
EA, S., M, G., M, F., J, G., M, D., K, M., H, E., & MM, M. (2026). In Situ Process Control during Wet-Chemical Etching of Heteroepitaxial III-V Layers Using Reflection Anisotropy Spectroscopy.. The journal of physical chemistry. A. https://doi.org/10.1021/acs.jpca.6c02573
Source records
- pubmed · retrieved 2026-09-25T11:18:26.919Z