Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants.

Hanzawa M, Ogura T, Akamatsu M, Sakai K, Sakai H

DOI: 10.1021/acs.langmuir.3c02034
Published: 2023 Oct 17
Container: Langmuir : the ACS journal of surfaces and colloids
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1021/acs.langmuir.3c02034,
  title = {Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants.},
  author = {Hanzawa M and Ogura T and Akamatsu M and Sakai K and Sakai H},
  year = {2023},
  journal = {Langmuir : the ACS journal of surfaces and colloids},
  doi = {10.1021/acs.langmuir.3c02034},
  url = {https://doi.org/10.1021/acs.langmuir.3c02034}
}

RIS

TY  - JOUR
TI  - Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants.
AU  - Hanzawa M
AU  - Ogura T
AU  - Akamatsu M
AU  - Sakai K
AU  - Sakai H
PY  - 2023
JO  - Langmuir : the ACS journal of surfaces and colloids
DO  - 10.1021/acs.langmuir.3c02034
UR  - https://doi.org/10.1021/acs.langmuir.3c02034
ER  -

APA

M, H., T, O., M, A., K, S., & H, S. (2023). Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants.. Langmuir : the ACS journal of surfaces and colloids. https://doi.org/10.1021/acs.langmuir.3c02034

Source records

pubmed · retrieved 2026-09-26T18:55:11.771Z
europe-pmc · retrieved 2026-09-26T18:55:11.779Z