Correlation between Deposition Parameters and Hydrogen Production in CuO Nanostructured Thin Films.

Artioli GA, Mancini A, Barbieri VR, Quattrini MC, Quartarone E, Mozzati MC, Drera G, Sangaletti L, Gombac V, Fornasiero P, Malavasi L.

Open source

DOI: 10.1021/acs.langmuir.5b03917
Published: 2016-02-03
Container: Langmuir
Publisher: Not recorded
Open access: no

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Cite this work

BibTeX

@article{allodium:10.1021/acs.langmuir.5b03917,
  title = {Correlation between Deposition Parameters and Hydrogen Production in CuO Nanostructured Thin Films.},
  author = {Artioli GA and  Mancini A and  Barbieri VR and  Quattrini MC and  Quartarone E and  Mozzati MC and  Drera G and  Sangaletti L and  Gombac V and  Fornasiero P and  Malavasi L.},
  year = {2016},
  journal = {Langmuir},
  doi = {10.1021/acs.langmuir.5b03917},
  url = {https://doi.org/10.1021/acs.langmuir.5b03917}
}

RIS

TY  - JOUR
TI  - Correlation between Deposition Parameters and Hydrogen Production in CuO Nanostructured Thin Films.
AU  - Artioli GA
AU  -  Mancini A
AU  -  Barbieri VR
AU  -  Quattrini MC
AU  -  Quartarone E
AU  -  Mozzati MC
AU  -  Drera G
AU  -  Sangaletti L
AU  -  Gombac V
AU  -  Fornasiero P
AU  -  Malavasi L.
PY  - 2016
JO  - Langmuir
DO  - 10.1021/acs.langmuir.5b03917
UR  - https://doi.org/10.1021/acs.langmuir.5b03917
ER  -

APA

GA, A., A, M., VR, B., MC, Q., E, Q., MC, M., G, D., L, S., V, G., P, F., & L., M. (2016). Correlation between Deposition Parameters and Hydrogen Production in CuO Nanostructured Thin Films.. Langmuir. https://doi.org/10.1021/acs.langmuir.5b03917

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europe-pmc · retrieved 2026-09-27T05:07:28.951Z