Pushing Ultrafast Laser Technology to Atomic-Level Manufacturing.

Wang L, Yin K, Xiao J, Zhang F, Chen Y, Duan JA

DOI: 10.1021/acs.langmuir.5c04902
Published: 2026 Jan 13
Container: Langmuir : the ACS journal of surfaces and colloids
Publisher: Not recorded
Open access: no

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Cite this work

BibTeX

@article{allodium:10.1021/acs.langmuir.5c04902,
  title = {Pushing Ultrafast Laser Technology to Atomic-Level Manufacturing.},
  author = {Wang L and Yin K and Xiao J and Zhang F and Chen Y and Duan JA},
  year = {2026},
  journal = {Langmuir : the ACS journal of surfaces and colloids},
  doi = {10.1021/acs.langmuir.5c04902},
  url = {https://doi.org/10.1021/acs.langmuir.5c04902}
}

RIS

TY  - JOUR
TI  - Pushing Ultrafast Laser Technology to Atomic-Level Manufacturing.
AU  - Wang L
AU  - Yin K
AU  - Xiao J
AU  - Zhang F
AU  - Chen Y
AU  - Duan JA
PY  - 2026
JO  - Langmuir : the ACS journal of surfaces and colloids
DO  - 10.1021/acs.langmuir.5c04902
UR  - https://doi.org/10.1021/acs.langmuir.5c04902
ER  -

APA

L, W., K, Y., J, X., F, Z., Y, C., & JA, D. (2026). Pushing Ultrafast Laser Technology to Atomic-Level Manufacturing.. Langmuir : the ACS journal of surfaces and colloids. https://doi.org/10.1021/acs.langmuir.5c04902

Source records

pubmed · retrieved 2026-09-25T23:13:35.682Z
europe-pmc · retrieved 2026-09-25T23:13:35.702Z