Insight into an Efficient Slurry for Chemical Mechanical Polishing of YAG Based on a Pitch Pad.
- DOI
- 10.1021/acs.langmuir.6c01353
- Published
- 2026 Jun 2
- Container
- Langmuir : the ACS journal of surfaces and colloids
- Publisher
- Not recorded
- Open access
- unknown
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limited evidence Score 43/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.
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Cite this work
BibTeX
@article{allodium:10.1021/acs.langmuir.6c01353,
title = {Insight into an Efficient Slurry for Chemical Mechanical Polishing of YAG Based on a Pitch Pad.},
author = {Gao S and Dong H and Guo X and Huang J and Kang R},
year = {2026},
journal = {Langmuir : the ACS journal of surfaces and colloids},
doi = {10.1021/acs.langmuir.6c01353},
url = {https://doi.org/10.1021/acs.langmuir.6c01353}
}RIS
TY - JOUR TI - Insight into an Efficient Slurry for Chemical Mechanical Polishing of YAG Based on a Pitch Pad. AU - Gao S AU - Dong H AU - Guo X AU - Huang J AU - Kang R PY - 2026 JO - Langmuir : the ACS journal of surfaces and colloids DO - 10.1021/acs.langmuir.6c01353 UR - https://doi.org/10.1021/acs.langmuir.6c01353 ER -
APA
S, G., H, D., X, G., J, H., & R, K. (2026). Insight into an Efficient Slurry for Chemical Mechanical Polishing of YAG Based on a Pitch Pad.. Langmuir : the ACS journal of surfaces and colloids. https://doi.org/10.1021/acs.langmuir.6c01353
Source records
- pubmed · retrieved 2026-09-26T04:01:25.627Z