Conformal Photoresist Coating of a Silicon Blind Via Based on an Acoustic Resonance Atomizer.

Li J, Li S, Lu S, Zhang L

DOI: 10.1021/acs.langmuir.6c02567
Published: 2026 Sep 8
Container: Langmuir : the ACS journal of surfaces and colloids
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1021/acs.langmuir.6c02567,
  title = {Conformal Photoresist Coating of a Silicon Blind Via Based on an Acoustic Resonance Atomizer.},
  author = {Li J and Li S and Lu S and Zhang L},
  year = {2026},
  journal = {Langmuir : the ACS journal of surfaces and colloids},
  doi = {10.1021/acs.langmuir.6c02567},
  url = {https://doi.org/10.1021/acs.langmuir.6c02567}
}

RIS

TY  - JOUR
TI  - Conformal Photoresist Coating of a Silicon Blind Via Based on an Acoustic Resonance Atomizer.
AU  - Li J
AU  - Li S
AU  - Lu S
AU  - Zhang L
PY  - 2026
JO  - Langmuir : the ACS journal of surfaces and colloids
DO  - 10.1021/acs.langmuir.6c02567
UR  - https://doi.org/10.1021/acs.langmuir.6c02567
ER  -

APA

J, L., S, L., S, L., & L, Z. (2026). Conformal Photoresist Coating of a Silicon Blind Via Based on an Acoustic Resonance Atomizer.. Langmuir : the ACS journal of surfaces and colloids. https://doi.org/10.1021/acs.langmuir.6c02567

Source records

pubmed · retrieved 2026-09-25T22:56:16.174Z