Design and Optimization of Driving Waveform for Inkjet Printing Photoresist with UltraLow Viscosity.

Wang X, Feng B, Huang Y, Wang G, Gu X, Zhai F

DOI: 10.1021/acs.langmuir.6c02866
Published: 2026 Jun 16
Container: Langmuir : the ACS journal of surfaces and colloids
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1021/acs.langmuir.6c02866,
  title = {Design and Optimization of Driving Waveform for Inkjet Printing Photoresist with UltraLow Viscosity.},
  author = {Wang X and Feng B and Huang Y and Wang G and Gu X and Zhai F},
  year = {2026},
  journal = {Langmuir : the ACS journal of surfaces and colloids},
  doi = {10.1021/acs.langmuir.6c02866},
  url = {https://doi.org/10.1021/acs.langmuir.6c02866}
}

RIS

TY  - JOUR
TI  - Design and Optimization of Driving Waveform for Inkjet Printing Photoresist with UltraLow Viscosity.
AU  - Wang X
AU  - Feng B
AU  - Huang Y
AU  - Wang G
AU  - Gu X
AU  - Zhai F
PY  - 2026
JO  - Langmuir : the ACS journal of surfaces and colloids
DO  - 10.1021/acs.langmuir.6c02866
UR  - https://doi.org/10.1021/acs.langmuir.6c02866
ER  -

APA

X, W., B, F., Y, H., G, W., X, G., & F, Z. (2026). Design and Optimization of Driving Waveform for Inkjet Printing Photoresist with UltraLow Viscosity.. Langmuir : the ACS journal of surfaces and colloids. https://doi.org/10.1021/acs.langmuir.6c02866

Source records

pubmed · retrieved 2026-09-26T12:59:35.066Z