Exploiting Stray Electric Fields in Maskless Electrochemical Machining for Spatially Programmable Superhydrophobic Tapered Microstructure Arrays.

Sun H, Ren W, Xu J, Deng H, Wang Q, Lu Q

Open source

DOI
10.1021/acs.langmuir.6c04576
Published
2026 Aug 25
Container
Langmuir : the ACS journal of surfaces and colloids
Publisher
Not recorded
Open access
unknown

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BibTeX

@article{allodium:10.1021/acs.langmuir.6c04576,
  title = {Exploiting Stray Electric Fields in Maskless Electrochemical Machining for Spatially Programmable Superhydrophobic Tapered Microstructure Arrays.},
  author = {Sun H and Ren W and Xu J and Deng H and Wang Q and Lu Q},
  year = {2026},
  journal = {Langmuir : the ACS journal of surfaces and colloids},
  doi = {10.1021/acs.langmuir.6c04576},
  url = {https://doi.org/10.1021/acs.langmuir.6c04576}
}

RIS

TY  - JOUR
TI  - Exploiting Stray Electric Fields in Maskless Electrochemical Machining for Spatially Programmable Superhydrophobic Tapered Microstructure Arrays.
AU  - Sun H
AU  - Ren W
AU  - Xu J
AU  - Deng H
AU  - Wang Q
AU  - Lu Q
PY  - 2026
JO  - Langmuir : the ACS journal of surfaces and colloids
DO  - 10.1021/acs.langmuir.6c04576
UR  - https://doi.org/10.1021/acs.langmuir.6c04576
ER  - 

APA

H, S., W, R., J, X., H, D., Q, W., & Q, L. (2026). Exploiting Stray Electric Fields in Maskless Electrochemical Machining for Spatially Programmable Superhydrophobic Tapered Microstructure Arrays.. Langmuir : the ACS journal of surfaces and colloids. https://doi.org/10.1021/acs.langmuir.6c04576

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