Breaking Electrochemical Scaling Laws in Atomically Engineered van der Waals Stack Multisite Edge Catalysts.

Chen DR, Muthu J, Chang JT, Lin PH, Chen YX, Khurshid F, Chin HT, Kong J, Hofmann M, Hsieh YP

Open source

DOI
10.1021/acs.nanolett.5c03027
Published
2025 Aug 6
Container
Nano letters
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1021/acs.nanolett.5c03027,
  title = {Breaking Electrochemical Scaling Laws in Atomically Engineered van der Waals Stack Multisite Edge Catalysts.},
  author = {Chen DR and Muthu J and Chang JT and Lin PH and Chen YX and Khurshid F and Chin HT and Kong J and Hofmann M and Hsieh YP},
  year = {2025},
  journal = {Nano letters},
  doi = {10.1021/acs.nanolett.5c03027},
  url = {https://doi.org/10.1021/acs.nanolett.5c03027}
}

RIS

TY  - JOUR
TI  - Breaking Electrochemical Scaling Laws in Atomically Engineered van der Waals Stack Multisite Edge Catalysts.
AU  - Chen DR
AU  - Muthu J
AU  - Chang JT
AU  - Lin PH
AU  - Chen YX
AU  - Khurshid F
AU  - Chin HT
AU  - Kong J
AU  - Hofmann M
AU  - Hsieh YP
PY  - 2025
JO  - Nano letters
DO  - 10.1021/acs.nanolett.5c03027
UR  - https://doi.org/10.1021/acs.nanolett.5c03027
ER  - 

APA

DR, C., J, M., JT, C., PH, L., YX, C., F, K., HT, C., J, K., M, H., & YP, H. (2025). Breaking Electrochemical Scaling Laws in Atomically Engineered van der Waals Stack Multisite Edge Catalysts.. Nano letters. https://doi.org/10.1021/acs.nanolett.5c03027

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