Low-Temperature Fabrication of Refractory Thin Films via Electric Field and Contact Stress-Activated Sintering of Nanoparticles: An <i>In Situ</i> Study
- DOI
- 10.1021/acs.nanolett.5c04675
- Published
- 2025-11-17
- Container
- Nano Letters
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acs.nanolett.5c04675,
title = {Low-Temperature Fabrication of Refractory Thin Films via Electric Field and Contact Stress-Activated Sintering of Nanoparticles: An
<i>In Situ</i>
Study},
author = {Bunty Tomar and Pranjal Nautiyal},
year = {2025},
journal = {Nano Letters},
doi = {10.1021/acs.nanolett.5c04675},
url = {https://doi.org/10.1021/acs.nanolett.5c04675}
}RIS
TY - JOUR
TI - Low-Temperature Fabrication of Refractory Thin Films via Electric Field and Contact Stress-Activated Sintering of Nanoparticles: An
<i>In Situ</i>
Study
AU - Bunty Tomar
AU - Pranjal Nautiyal
PY - 2025
JO - Nano Letters
DO - 10.1021/acs.nanolett.5c04675
UR - https://doi.org/10.1021/acs.nanolett.5c04675
ER - APA
Tomar, B., & Nautiyal, P. (2025). Low-Temperature Fabrication of Refractory Thin Films via Electric Field and Contact Stress-Activated Sintering of Nanoparticles: An <i>In Situ</i> Study. Nano Letters. https://doi.org/10.1021/acs.nanolett.5c04675
Source records
- crossref · retrieved 2026-09-26T10:15:37.121Z