Tunable Defect Engineering in NaYF(4) Nanoparticles:Tailoring Trap States for Enhanced NIR-II Bioimaging.

Wei H, Shen Q, Zhou W, Li J, Zheng Q, Zou Z, Huang Y, Zhong J, Dong J, Wen X, Deng Z

DOI: 10.1021/acs.nanolett.5c04718
Published: 2025 Nov 5
Container: Nano letters
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1021/acs.nanolett.5c04718,
  title = {Tunable Defect Engineering in NaYF(4) Nanoparticles:Tailoring Trap States for Enhanced NIR-II Bioimaging.},
  author = {Wei H and Shen Q and Zhou W and Li J and Zheng Q and Zou Z and Huang Y and Zhong J and Dong J and Wen X and Deng Z},
  year = {2025},
  journal = {Nano letters},
  doi = {10.1021/acs.nanolett.5c04718},
  url = {https://doi.org/10.1021/acs.nanolett.5c04718}
}

RIS

TY  - JOUR
TI  - Tunable Defect Engineering in NaYF(4) Nanoparticles:Tailoring Trap States for Enhanced NIR-II Bioimaging.
AU  - Wei H
AU  - Shen Q
AU  - Zhou W
AU  - Li J
AU  - Zheng Q
AU  - Zou Z
AU  - Huang Y
AU  - Zhong J
AU  - Dong J
AU  - Wen X
AU  - Deng Z
PY  - 2025
JO  - Nano letters
DO  - 10.1021/acs.nanolett.5c04718
UR  - https://doi.org/10.1021/acs.nanolett.5c04718
ER  -

APA

H, W., Q, S., W, Z., J, L., Q, Z., Z, Z., Y, H., J, Z., J, D., X, W., & Z, D. (2025). Tunable Defect Engineering in NaYF(4) Nanoparticles:Tailoring Trap States for Enhanced NIR-II Bioimaging.. Nano letters. https://doi.org/10.1021/acs.nanolett.5c04718

Source records

pubmed · retrieved 2026-09-26T07:10:37.525Z