Wafer-Scale Deposition of 2D SnSe with Monolayer-Thickness Precision.

Garten LM, Wolfe HE, Knight J, Chin JR, Wahl JD, Frye MB

DOI: 10.1021/acs.nanolett.6c01711
Published: 2026 Sep 9
Container: Nano letters
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1021/acs.nanolett.6c01711,
  title = {Wafer-Scale Deposition of 2D SnSe with Monolayer-Thickness Precision.},
  author = {Garten LM and Wolfe HE and Knight J and Chin JR and Wahl JD and Frye MB},
  year = {2026},
  journal = {Nano letters},
  doi = {10.1021/acs.nanolett.6c01711},
  url = {https://doi.org/10.1021/acs.nanolett.6c01711}
}

RIS

TY  - JOUR
TI  - Wafer-Scale Deposition of 2D SnSe with Monolayer-Thickness Precision.
AU  - Garten LM
AU  - Wolfe HE
AU  - Knight J
AU  - Chin JR
AU  - Wahl JD
AU  - Frye MB
PY  - 2026
JO  - Nano letters
DO  - 10.1021/acs.nanolett.6c01711
UR  - https://doi.org/10.1021/acs.nanolett.6c01711
ER  -

APA

LM, G., HE, W., J, K., JR, C., JD, W., & MB, F. (2026). Wafer-Scale Deposition of 2D SnSe with Monolayer-Thickness Precision.. Nano letters. https://doi.org/10.1021/acs.nanolett.6c01711

Source records

pubmed · retrieved 2026-09-26T06:32:09.619Z