Resist-Free Shadow Deposition Using Silicon Trenches for Josephson Junctions in Superconducting Qubits

Tathagata Banerjee, Stephen Daniel Funni, Saswata Roy, Judy J. Cha, Valla Fatemi

Open source

DOI
10.1021/acs.nanolett.6c02734
Published
2026-10-22
Container
Nano Letters
Publisher
American Chemical Society (ACS)
Open access
unknown

Credibility signals

uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

Cite this work

BibTeX

@article{allodium:10.1021/acs.nanolett.6c02734,
  title = {Resist-Free
Shadow Deposition Using Silicon Trenches
for Josephson Junctions in Superconducting Qubits},
  author = {Tathagata Banerjee and Stephen Daniel Funni and Saswata Roy and Judy J. Cha and Valla Fatemi},
  year = {2026},
  journal = {Nano Letters},
  doi = {10.1021/acs.nanolett.6c02734},
  url = {https://doi.org/10.1021/acs.nanolett.6c02734}
}

RIS

TY  - JOUR
TI  - Resist-Free
Shadow Deposition Using Silicon Trenches
for Josephson Junctions in Superconducting Qubits
AU  - Tathagata Banerjee
AU  - Stephen Daniel Funni
AU  - Saswata Roy
AU  - Judy J. Cha
AU  - Valla Fatemi
PY  - 2026
JO  - Nano Letters
DO  - 10.1021/acs.nanolett.6c02734
UR  - https://doi.org/10.1021/acs.nanolett.6c02734
ER  - 

APA

Banerjee, T., Funni, S. D., Roy, S., Cha, J. J., & Fatemi, V. (2026). Resist-Free Shadow Deposition Using Silicon Trenches for Josephson Junctions in Superconducting Qubits. Nano Letters. https://doi.org/10.1021/acs.nanolett.6c02734

Source records