Highly Efficient Postprocessing Cleaning of van der Waals Devices

Zhaokuan Yu, Yuqing He, Juntai Wu, Xin Lu, Quanshui Zheng, Ming Ma

Open source

DOI
10.1021/acs.nanolett.6c02887
Published
2026-08-18
Container
Nano Letters
Publisher
American Chemical Society (ACS)
Open access
unknown

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BibTeX

@article{allodium:10.1021/acs.nanolett.6c02887,
  title = {Highly Efficient
Postprocessing Cleaning of van der
Waals Devices},
  author = {Zhaokuan Yu and Yuqing He and Juntai Wu and Xin Lu and Quanshui Zheng and Ming Ma},
  year = {2026},
  journal = {Nano Letters},
  doi = {10.1021/acs.nanolett.6c02887},
  url = {https://doi.org/10.1021/acs.nanolett.6c02887}
}

RIS

TY  - JOUR
TI  - Highly Efficient
Postprocessing Cleaning of van der
Waals Devices
AU  - Zhaokuan Yu
AU  - Yuqing He
AU  - Juntai Wu
AU  - Xin Lu
AU  - Quanshui Zheng
AU  - Ming Ma
PY  - 2026
JO  - Nano Letters
DO  - 10.1021/acs.nanolett.6c02887
UR  - https://doi.org/10.1021/acs.nanolett.6c02887
ER  - 

APA

Yu, Z., He, Y., Wu, J., Lu, X., Zheng, Q., & Ma, M. (2026). Highly Efficient Postprocessing Cleaning of van der Waals Devices. Nano Letters. https://doi.org/10.1021/acs.nanolett.6c02887

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