Highly Efficient Postprocessing Cleaning of van der Waals Devices
- DOI
- 10.1021/acs.nanolett.6c02887
- Published
- 2026-08-18
- Container
- Nano Letters
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acs.nanolett.6c02887,
title = {Highly Efficient
Postprocessing Cleaning of van der
Waals Devices},
author = {Zhaokuan Yu and Yuqing He and Juntai Wu and Xin Lu and Quanshui Zheng and Ming Ma},
year = {2026},
journal = {Nano Letters},
doi = {10.1021/acs.nanolett.6c02887},
url = {https://doi.org/10.1021/acs.nanolett.6c02887}
}RIS
TY - JOUR TI - Highly Efficient Postprocessing Cleaning of van der Waals Devices AU - Zhaokuan Yu AU - Yuqing He AU - Juntai Wu AU - Xin Lu AU - Quanshui Zheng AU - Ming Ma PY - 2026 JO - Nano Letters DO - 10.1021/acs.nanolett.6c02887 UR - https://doi.org/10.1021/acs.nanolett.6c02887 ER -
APA
Yu, Z., He, Y., Wu, J., Lu, X., Zheng, Q., & Ma, M. (2026). Highly Efficient Postprocessing Cleaning of van der Waals Devices. Nano Letters. https://doi.org/10.1021/acs.nanolett.6c02887
Source records
- crossref · retrieved 2026-09-25T15:01:21.379Z