Mechanistic Advantages of Organotin Molecular EUV Photoresists.

Ma JH, Needham C, Wang H, Neureuther A, Prendergast D, Naulleau P

DOI: 10.1021/acsami.1c12411
Published: 2022 Feb 2
Container: ACS applied materials & interfaces
Publisher: Not recorded
Open access: no

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Cite this work

BibTeX

@article{allodium:10.1021/acsami.1c12411,
  title = {Mechanistic Advantages of Organotin Molecular EUV Photoresists.},
  author = {Ma JH and Needham C and Wang H and Neureuther A and Prendergast D and Naulleau P},
  year = {2022},
  journal = {ACS applied materials \& interfaces},
  doi = {10.1021/acsami.1c12411},
  url = {https://doi.org/10.1021/acsami.1c12411}
}

RIS

TY  - JOUR
TI  - Mechanistic Advantages of Organotin Molecular EUV Photoresists.
AU  - Ma JH
AU  - Needham C
AU  - Wang H
AU  - Neureuther A
AU  - Prendergast D
AU  - Naulleau P
PY  - 2022
JO  - ACS applied materials & interfaces
DO  - 10.1021/acsami.1c12411
UR  - https://doi.org/10.1021/acsami.1c12411
ER  -

APA

JH, M., C, N., H, W., A, N., D, P., & P, N. (2022). Mechanistic Advantages of Organotin Molecular EUV Photoresists.. ACS applied materials & interfaces. https://doi.org/10.1021/acsami.1c12411

Source records

pubmed · retrieved 2026-09-26T22:06:15.168Z
europe-pmc · retrieved 2026-09-26T22:06:15.185Z