Antireflective GaN Nanoridge Texturing by Metal-Assisted Chemical Etching via a Thermally Dewetted Pt Catalyst Network for Highly Responsive Ultraviolet Photodiodes
- DOI
- 10.1021/acsami.2c22929
- Published
- 2023-03-07
- Container
- ACS Applied Materials & Interfaces
- Publisher
- American Chemical Society (ACS)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.2c22929,
title = {Antireflective GaN Nanoridge Texturing by Metal-Assisted Chemical Etching via a Thermally Dewetted Pt Catalyst Network for Highly Responsive Ultraviolet Photodiodes},
author = {Yikai Liao and You Jin Kim and Junyu Lai and Jung-Hun Seo and Munho Kim},
year = {2023},
journal = {ACS Applied Materials \& Interfaces},
doi = {10.1021/acsami.2c22929},
url = {https://doi.org/10.1021/acsami.2c22929}
}RIS
TY - JOUR TI - Antireflective GaN Nanoridge Texturing by Metal-Assisted Chemical Etching via a Thermally Dewetted Pt Catalyst Network for Highly Responsive Ultraviolet Photodiodes AU - Yikai Liao AU - You Jin Kim AU - Junyu Lai AU - Jung-Hun Seo AU - Munho Kim PY - 2023 JO - ACS Applied Materials & Interfaces DO - 10.1021/acsami.2c22929 UR - https://doi.org/10.1021/acsami.2c22929 ER -
APA
Liao, Y., Kim, Y. J., Lai, J., Seo, J., & Kim, M. (2023). Antireflective GaN Nanoridge Texturing by Metal-Assisted Chemical Etching via a Thermally Dewetted Pt Catalyst Network for Highly Responsive Ultraviolet Photodiodes. ACS Applied Materials & Interfaces. https://doi.org/10.1021/acsami.2c22929
Source records
- crossref · retrieved 2026-09-26T17:50:28.966Z