Achieving a High Thermally Conductive One Micron AlN Deposition by High Power Impulse Magnetron Sputtering plus Kick.
- DOI
- 10.1021/acsami.4c00993
- Published
- 2024 May 22
- Container
- ACS applied materials & interfaces
- Publisher
- Not recorded
- Open access
- no
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.4c00993,
title = {Achieving a High Thermally Conductive One Micron AlN Deposition by High Power Impulse Magnetron Sputtering plus Kick.},
author = {Lee PC and McLeod AJ and Choi M and Vaca D and Mora DC and Wang K and Yun S and Dutta J and Pal D and Kumar S and Kummel AC},
year = {2024},
journal = {ACS applied materials \& interfaces},
doi = {10.1021/acsami.4c00993},
url = {https://doi.org/10.1021/acsami.4c00993}
}RIS
TY - JOUR TI - Achieving a High Thermally Conductive One Micron AlN Deposition by High Power Impulse Magnetron Sputtering plus Kick. AU - Lee PC AU - McLeod AJ AU - Choi M AU - Vaca D AU - Mora DC AU - Wang K AU - Yun S AU - Dutta J AU - Pal D AU - Kumar S AU - Kummel AC PY - 2024 JO - ACS applied materials & interfaces DO - 10.1021/acsami.4c00993 UR - https://doi.org/10.1021/acsami.4c00993 ER -
APA
PC, L., AJ, M., M, C., D, V., DC, M., K, W., S, Y., J, D., D, P., S, K., & AC, K. (2024). Achieving a High Thermally Conductive One Micron AlN Deposition by High Power Impulse Magnetron Sputtering plus Kick.. ACS applied materials & interfaces. https://doi.org/10.1021/acsami.4c00993
Source records
- pubmed · retrieved 2026-09-27T10:59:03.031Z
- europe-pmc · retrieved 2026-09-27T10:59:03.026Z