Growth Behavior of Ni on Hydrogen-Etched WS(2) Surface.

Liu HT, Chen WH, Chang SJ, Yang CC, Wang CH, Liu WT, Chen KY, Kawakami N, Lin KB, Lin CL, Hu C

Open source

DOI
10.1021/acsami.4c11506
Published
2024 Oct 16
Container
ACS applied materials & interfaces
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1021/acsami.4c11506,
  title = {Growth Behavior of Ni on Hydrogen-Etched WS(2) Surface.},
  author = {Liu HT and Chen WH and Chang SJ and Yang CC and Wang CH and Liu WT and Chen KY and Kawakami N and Lin KB and Lin CL and Hu C},
  year = {2024},
  journal = {ACS applied materials \& interfaces},
  doi = {10.1021/acsami.4c11506},
  url = {https://doi.org/10.1021/acsami.4c11506}
}

RIS

TY  - JOUR
TI  - Growth Behavior of Ni on Hydrogen-Etched WS(2) Surface.
AU  - Liu HT
AU  - Chen WH
AU  - Chang SJ
AU  - Yang CC
AU  - Wang CH
AU  - Liu WT
AU  - Chen KY
AU  - Kawakami N
AU  - Lin KB
AU  - Lin CL
AU  - Hu C
PY  - 2024
JO  - ACS applied materials & interfaces
DO  - 10.1021/acsami.4c11506
UR  - https://doi.org/10.1021/acsami.4c11506
ER  - 

APA

HT, L., WH, C., SJ, C., CC, Y., CH, W., WT, L., KY, C., N, K., KB, L., CL, L., & C, H. (2024). Growth Behavior of Ni on Hydrogen-Etched WS(2) Surface.. ACS applied materials & interfaces. https://doi.org/10.1021/acsami.4c11506

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