Strategic Material Design for Highly Reliable QLC 3D V-NAND Using Bypass Resistive Random Access Memory.

Han G, Seo J, Park J, Hong M, Kim J, Lee K, Kim W, Ha D, Hwang H

Open source

DOI
10.1021/acsami.5c00352
Published
2025 Apr 2
Container
ACS applied materials & interfaces
Publisher
Not recorded
Open access
unknown

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BibTeX

@article{allodium:10.1021/acsami.5c00352,
  title = {Strategic Material Design for Highly Reliable QLC 3D V-NAND Using Bypass Resistive Random Access Memory.},
  author = {Han G and Seo J and Park J and Hong M and Kim J and Lee K and Kim W and Ha D and Hwang H},
  year = {2025},
  journal = {ACS applied materials \& interfaces},
  doi = {10.1021/acsami.5c00352},
  url = {https://doi.org/10.1021/acsami.5c00352}
}

RIS

TY  - JOUR
TI  - Strategic Material Design for Highly Reliable QLC 3D V-NAND Using Bypass Resistive Random Access Memory.
AU  - Han G
AU  - Seo J
AU  - Park J
AU  - Hong M
AU  - Kim J
AU  - Lee K
AU  - Kim W
AU  - Ha D
AU  - Hwang H
PY  - 2025
JO  - ACS applied materials & interfaces
DO  - 10.1021/acsami.5c00352
UR  - https://doi.org/10.1021/acsami.5c00352
ER  - 

APA

G, H., J, S., J, P., M, H., J, K., K, L., W, K., D, H., & H, H. (2025). Strategic Material Design for Highly Reliable QLC 3D V-NAND Using Bypass Resistive Random Access Memory.. ACS applied materials & interfaces. https://doi.org/10.1021/acsami.5c00352

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