Integrated Strategies for Overcoming Resolution Limits in Electron Beam Lithography of Chemically Amplified Resists.

Wu X, Tiwale N, Stein A, Nam CY

DOI: 10.1021/acsami.5c18774
Published: 2026 Feb 18
Container: ACS applied materials & interfaces
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1021/acsami.5c18774,
  title = {Integrated Strategies for Overcoming Resolution Limits in Electron Beam Lithography of Chemically Amplified Resists.},
  author = {Wu X and Tiwale N and Stein A and Nam CY},
  year = {2026},
  journal = {ACS applied materials \& interfaces},
  doi = {10.1021/acsami.5c18774},
  url = {https://doi.org/10.1021/acsami.5c18774}
}

RIS

TY  - JOUR
TI  - Integrated Strategies for Overcoming Resolution Limits in Electron Beam Lithography of Chemically Amplified Resists.
AU  - Wu X
AU  - Tiwale N
AU  - Stein A
AU  - Nam CY
PY  - 2026
JO  - ACS applied materials & interfaces
DO  - 10.1021/acsami.5c18774
UR  - https://doi.org/10.1021/acsami.5c18774
ER  -

APA

X, W., N, T., A, S., & CY, N. (2026). Integrated Strategies for Overcoming Resolution Limits in Electron Beam Lithography of Chemically Amplified Resists.. ACS applied materials & interfaces. https://doi.org/10.1021/acsami.5c18774

Source records

pubmed · retrieved 2026-09-25T18:14:14.555Z