Machine Learning-Enabled In Situ Diagnostics for Intelligent Plasma-Based Semiconductor Manufacturing: A Review.
- DOI
- 10.1021/acsami.6c04768
- Published
- 2026 Jul 15
- Container
- ACS applied materials & interfaces
- Publisher
- Not recorded
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1021/acsami.6c04768,
title = {Machine Learning-Enabled In Situ Diagnostics for Intelligent Plasma-Based Semiconductor Manufacturing: A Review.},
author = {Kang M and Kim S and Go E and Byun S and Cho D and Kim T and Kang H and Lee J and Ko M and Jeon N and Choi MS and Kim HU},
year = {2026},
journal = {ACS applied materials \& interfaces},
doi = {10.1021/acsami.6c04768},
url = {https://doi.org/10.1021/acsami.6c04768}
}RIS
TY - JOUR TI - Machine Learning-Enabled In Situ Diagnostics for Intelligent Plasma-Based Semiconductor Manufacturing: A Review. AU - Kang M AU - Kim S AU - Go E AU - Byun S AU - Cho D AU - Kim T AU - Kang H AU - Lee J AU - Ko M AU - Jeon N AU - Choi MS AU - Kim HU PY - 2026 JO - ACS applied materials & interfaces DO - 10.1021/acsami.6c04768 UR - https://doi.org/10.1021/acsami.6c04768 ER -
APA
M, K., S, K., E, G., S, B., D, C., T, K., H, K., J, L., M, K., N, J., MS, C., & HU, K. (2026). Machine Learning-Enabled In Situ Diagnostics for Intelligent Plasma-Based Semiconductor Manufacturing: A Review.. ACS applied materials & interfaces. https://doi.org/10.1021/acsami.6c04768
Source records
- pubmed · retrieved 2026-09-25T18:28:52.973Z